Stoichiometry control of the two gas reactive sputtering process-Reference-Cited by-同舟云学术

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Stoichiometry control of the two gas reactive sputtering process

Published:2019-11 Issue: Volume: Page:
ISSN:
Container-title:2019 IEEE 19th International Symposium on Computational Intelligence and Informatics and 7th IEEE International Conference on Recent Achievements in Mechatronics, Automation, Computer Sciences and Robotics (CINTI-MACRo)
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Author:

Madarasz Robert Rossi,Kelemen Andras

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9098999/9105123/09105135.pdf?arnumber=9105135

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reactive Magnetron Sputtering Control Based on an Analytical Condition of Stoichiometry;Acta Universitatis Sapientiae, Electrical and Mechanical Engineering;2023-12-01

2. Reactive magnetron sputtering: an offline parameter identification method;2021 IEEE 15th International Symposium on Applied Computational Intelligence and Informatics (SACI);2021-05-19

3. Modeling reactive magnetron sputtering: a survey of different modeling approaches;Acta Universitatis Sapientiae, Informatica;2020-07-01

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