Modeling reactive magnetron sputtering: a survey of different modeling approaches
Author:
Affiliation:
1. Doctoral School of Applied Informatics and Applied Mathematics , Óbuda University Budapest , Hungary
2. Sapientia Hungarian University of Transylvania , Cluj-Napoca , Romania
3. Óbuda University , Budapest , Hungary
Abstract
Publisher
Walter de Gruyter GmbH
Link
https://www.sciendo.com/pdf/10.2478/ausi-2020-0008
Reference68 articles.
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3. [3] S. Berg, H.-O. Blom, T. Larsson, C. Nender. Modeling of reactive sputtering of compound materials. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 5, 2 (1987) 202–207. ⇒120, 124
4. [4] S. Berg, C. Nender. Modeling of mass transport and gas kinetics of the reactive sputtering process. Le Journal de Physique IV, 5 (C5):C5–45, 1995. ⇒120, 124
5. [5] S. Berg, T. Nyberg, H.-O. Blom, C. Nender. Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 16, 3 (1998) 1277–1285. ⇒120 122, 123 124
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