Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process-Reference-Cited by-同舟云学术

Computer modeling as a tool to predict deposition rate and film composition in the reactive sputtering process

Published:1998-05 Issue:3 Volume:16 Page:1277-1285
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Berg S.,Nyberg T.,Blom H.-O.,Nender C.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581274

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