PREVAIL — Evolution and properties of large area reduction projection electron optics-Reference-Cited by-同舟云学术

PREVAIL — Evolution and properties of large area reduction projection electron optics

Published:2000-06 Issue:1-4 Volume:53 Page:283-286
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Stickel W.,Langner G.O.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. PREVAIL - An e-beam stepper with Variable Axis Immersion Lenses

2. Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography

3. Pfeiffer, H.C. et al., these proceedings

4. Variable axis lens for electron beams

5. Adv. Electronics & Electron Physics;Jansen,1990

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