-Reference-Cited by-同舟云学术

Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography

Author:

Zhu Xieqing,Liu Haoning,Munro Eric,Rouse John A.

Publisher

SPIE

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Dynamic Correction of Higher-Order Deflection Aberrations in the Environmental SEM;Microscopy and Microanalysis;2015-06

2. Determination of analytical expansion from numerical field data;Ultramicroscopy;2010-08

3. PREVAIL-EPL alpha tool: Early results;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2001

4. Comprehensive analysis of electron optical design of SCALPEL-HT/Alpha;SPIE Proceedings;2000-07-21

5. PREVAIL — Evolution and properties of large area reduction projection electron optics;Microelectronic Engineering;2000-06

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