Determination of analytical expansion from numerical field data
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Outline of an ultracorrector compensating for all primary chromatic and geometrical aberrations of charged-particle lenses
2. Calculation of aberration coefficients by ray tracing
3. �ber einige Fehler von Elektronenlinsen
4. Analysis of off-axis-shaped beam systems for high-throughput electron-beam lithography
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