PREVAIL—Electron projection technology approach for next-generation lithography-Reference-Cited by-同舟云学术

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PREVAIL—Electron projection technology approach for next-generation lithography

Published:2001-09 Issue:5 Volume:45 Page:615-638
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Dhaliwal R. S.,Enichen W. A.,Golladay S. D.,Gordon M. S.,Kendall R. A.,Lieberman J. E.,Pfeiffer H. C.,Pinckney D. J.,Robinson C. F.,Rockrohr J. D.,Stickel W.,Tressler E. V.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389064/05389066.pdf?arnumber=5389066

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