Small cluster ions from source of negative ions by cesium sputtering-Reference-Cited by-同舟云学术

Small cluster ions from source of negative ions by cesium sputtering

Published:2002-11 Issue:1-2 Volume:196 Page:198-204
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Wang X.M,Lu X.M,Shao L,Liu J.R,Chu W.K

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference26 articles.

1. Construction and Performance of a Low Voltage Arc as a Source of Positive Ions

2. J. Matsuo, D. Takeuchi, T. Aoki, I. Yamada, in: E. Ishida, S. Banerjee, S. Meta, T.C. Smith, M. Current, L. Larson, A. Tash (Eds.), IEEE Proceedings of the 11th International Conference on Ion Implantation Technology, Austin, TX, Vol. 1, issue 1, 16–21 June 1996, IEEE Service center, Piscataway, NJ, 1997, p. 768

3. Implantation damage effect on boron annealing behavior using low-energy polyatomic ion implantation

4. W.K. Chu, J.R Liu, J.Y. Jin, X.M. Lu, L. Shao, Q.M. Li, in: 16th International Conference on Application of Accelerators in Research and Industry, CAARI 2000, Denton, TX, USA, 1–4 November 2000, AIP Conference Proceedings 576, 2001, p. 891

5. Surface modification with gas cluster ion beams

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