Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam: The effect of etching conditions on surface structure-Reference-Cited by-同舟云学术

Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam: The effect of etching conditions on surface structure

Published:2018-01-07 Issue:1 Volume:123 Page:015303
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Park Eun Ji¹,Choi Chang Min¹,Kim Il Hee²,Kim Jung-Hwan¹,Lee Gaehang³,Jin Jong Sung⁴,Ganteför Gerd⁵,Kim Young Dok²,Choi Myoung Choul¹

Affiliation:

1. Mass Spectrometry and Advanced Instrument Group, Korea Basic Science Institute, Ochang Center, Chungbuk 28119, South Korea

2. Department of Chemistry, Sungkyunkwan University, Suwon 16419, South Korea

3. Korea Basic Science Institute, Daejeon 34133, South Korea

4. Division of High Technology Materials Research, Korea Basic Science Institute, Busan Center, Busan 46742, South Korea

5. Department of Physics, University of Konstanz, Konstanz D-78457, Germany

Funder

Korea Basic Science Institute

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5011686

Reference41 articles.

1. On the mechanism of cluster emission in sputtering

2. Mass distributions of negative cluster ions of copper, silver, and gold

3. Size Distribution Studies of Sputtered Transition Metal Cluster Ions by Fourier Transform Ion Cyclotron Resonance Mass Spectrometry

4. The physics of simple metal clusters: experimental aspects and simple models

5. Compact sputter source for deposition of small size-selected clusters

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