Etching of amorphous Al2O3 produced by ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference10 articles.
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4. Proc. 5th Conf. on Solid State Devices;Akasaka,1974
5. Enhanced etching of ion‐implanted silicon nitride in buffered hydrofluoric acid
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