Author:
Götzlich J. F.,Haberger K.,Ryssel H.,Kranz H.,Traumüller E.
Cited by
33 articles.
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1. Stencil-masked phosphorus-implanted silicon for solar cell applications;Materials Science in Semiconductor Processing;2021-03
2. Localized Ion Implantation Through Micro/Nanostencil Masks;IEEE Transactions on Nanotechnology;2011-09
3. Formation of As enriched layer by steam oxidation of As+-implanted Si;Applied Surface Science;2009-03
4. Rate enhancement during thermal oxidation of Ge+-implanted silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2005-12
5. Formation of optically-active, metal silicides using ion implantation and/or oxidation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2005-12