Effect of helium ion beam treatment on wet etching of silicon dioxide-Reference-Cited by-同舟云学术

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Effect of helium ion beam treatment on wet etching of silicon dioxide

Published:2018-03 Issue: Volume:418 Page:94-100
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Petrov Yu.V.,Grigoryev E.A.,Sharov T.V.,Baraban A.P.

Funder

Interdisciplinary Resource Centre for Nanotechnology of Research

St-Petersburg State University, Russia

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference42 articles.

1. Enhanced etching of sapphire damaged by ion implantation;Dongzhu;J. Phys. D Appl. Phys.,1998

2. Etching of amorphous Al2O3 produced by ion implantation;McHargue;Nucl. Instr. Meth. Phys. Res. B,1997

3. Etching characteristics of SiO2 irradiated with focused ion beam;Sadoh;Nucl. Instr. Meth. Phys. Res. B,2003

4. Wet etching of ion-implanted silicon dioxide monitored by atomic-force microscopy;Bukharaev;Russ. Microlectron.,2002

5. Ion beam enhanced etching of LiNbO3;Schrempel;Nucl. Instr. Meth. Phys. Res. B,2006

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching;Nanomaterials;2022-09-20

2. A review of defect engineering, ion implantation, and nanofabrication using the helium ion microscope;Beilstein Journal of Nanotechnology;2021-07-02

3. Helium focused ion beam irradiation with subsequent chemical etching for the fabrication of nanostructures;Nanotechnology;2020-03-09

4. Fabrication of nanopores in silicon nitride membrane by means of wet etching enhanced by focused helium ion beam irradiation;AIP Conference Proceedings;2019

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