Characteristics of thin films formed by the ionized-cluster beam technique
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference6 articles.
1. Ionized‐cluster beam deposition
2. Ionized-cluster beam epitaxy
3. An evaluation of metal and semiconductor films formed by ionized-cluster beam deposition
4. Ionized-cluster beam deposition and epitaxy as fabrication techniques for electron devices
5. R.M. Burger and P.R. Donovan, Fundamentals of Silicon Integrated Device Technology (Prentice-Hall) (Translated in Japanese, p. 132).
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