An evaluation of metal and semiconductor films formed by ionized-cluster beam deposition-Reference-Cited by-同舟云学术

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An evaluation of metal and semiconductor films formed by ionized-cluster beam deposition

Published:1976-12 Issue: Volume:39 Page:207-217
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Takagi Toshinori,Yamada Isao,Sasaki Akio

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Proc. 2nd Int. Conf. on Ion Sources;Takagi,1972

2. Ionized‐cluster beam deposition

3. Proc. 6th Int. Vacuum Congr.;Takagi,1974

4. Proc. 2nd Symp. on Ion Sources and the Formation of Ion Beams;Takagi,1974

5. 5th Symp. on Fusion Technology;Burrows,1968

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