Detailed in-situ monitoring of film growth: application to TiSi2 chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
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1. Temperature-dependent surface diffusion parameters on amorphous materials;Surface Science;2002-04
2. Preparation and properties of TiSi2 thin films from TiCl4/H2 by plasma enhanced chemical vapor deposition;Journal of Crystal Growth;2002-01
3. Effects of Arsenic Doping on Chemical Vapor Deposition of Titanium Silicide;Journal of The Electrochemical Society;1999-11-01
4. Effect of Fluorine on Surface Morphology in Selective Epitaxial TiSi2 Growth by Plasma‐Enhanced Chemical Vapor Deposition;Journal of The Electrochemical Society;1998-05-01
5. Practical processing issues in titanium silicide CVD;Applied Surface Science;1997-09
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