Preparation and properties of TiSi2 thin films from TiCl4/H2 by plasma enhanced chemical vapor deposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference26 articles.
1. A comparative study of TiSi2 obtained by solid-state reaction and chemical vapor deposition
2. Selective Titanium Silicide for Industrial Applications
3. TiSi2/Si interface instability in plasma-assisted chemical vapor deposition of titanium
4. Optimization of selective TiSi2 chemical vapor deposition by mechanistic chemical kinetics
5. Optimized Deposition Parameters for Low Pressure Chemical Vapor Deposited Titanium Silicide
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