Effects of Arsenic Doping on Chemical Vapor Deposition of Titanium Silicide-Reference-Cited by-同舟云学术

Effects of Arsenic Doping on Chemical Vapor Deposition of Titanium Silicide

Published:1999-11-01 Issue:11 Volume:146 Page:4240-4245
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Fang Hua¹,Öztürk Mehmet C.¹,Seebauer E. G.²,Batchelor Dale E.³

Affiliation:

1. Department of Electrical and Computer Engineering

2. Department of Chemical Engineering, University of Illinois at Urbana‐Champaign, Urbana, Illinois 61801, United States of America

3. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695, United States of America

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1392621/pdf

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