Physical properties of copper oxide thin films prepared by dc reactive magnetron sputtering under different oxygen partial pressures-Reference-Cited by-同舟云学术

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Physical properties of copper oxide thin films prepared by dc reactive magnetron sputtering under different oxygen partial pressures

Published:2009-12 Issue:23-24 Volume:404 Page:4831-4834
ISSN:0921-4526
Container-title:Physica B: Condensed Matter
language:en
Short-container-title:Physica B: Condensed Matter

Author:

Chu Chun-Lung,Lu Hsin-Chun,Lo Chen-Yang,Lai Chi-You,Wang Yu-Hsiang

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Influence of hydrogen implantation on properties of n+p polycrystalline silicon solar cells

2. Optical characterization of thin thermal oxide films on copper by ellipsometry

3. Property variations of direct-current reactive magnetron sputtered copper oxide thin films deposited at different oxygen partial pressures

4. XPS study of the Cu@Cu2O core-shell nanoparticles

5. Synthesis and properties of Cu2O quantum particles

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1. Oxide phase and conductivity-type of copper oxide thin films deposited by direct current magnetron sputtering;Physica B: Condensed Matter;2024-10

2. Oxidation characteristics of copper oxide thin films deposited by direct current sputtering under substrate temperature and post-deposition copper-ion implantation;Thin Solid Films;2024-09

3. Advanced nano-texture, optical bandgap, and Urbach energy analysis of NiO/Si heterojunctions;Scientific Reports;2023-04-21

4. Effect of substrate temperature on the optical properties of DC magnetron sputtered copper oxide thin films;Physica B: Condensed Matter;2023-02

5. Variation in electrical, optical and structural properties of CuO thin films prepared by sol-gel spins coating technique by varying thickness;THE FOURTH SCIENTIFIC CONFERENCE FOR ELECTRICAL ENGINEERING TECHNIQUES RESEARCH (EETR2022);2023

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