Oxide phase and conductivity-type of copper oxide thin films deposited by direct current magnetron sputtering-Reference-Cited by-同舟云学术

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Oxide phase and conductivity-type of copper oxide thin films deposited by direct current magnetron sputtering

Published:2024-10 Issue: Volume:691 Page:416315
ISSN:0921-4526
Container-title:Physica B: Condensed Matter
language:en
Short-container-title:Physica B: Condensed Matter

Author:

Devaraj Perumal,Peranantham Pazhanisami^ORCID,Jeyachandran Yekkoni Lakshmanan^ORCID

Publisher

Elsevier BV

Reference84 articles.

1. Binary copper oxide semiconductor: from materials towards devices;Meyer;Phys. Status Solidi B,2012

2. One step copper oxide (CuO) thin film deposition for non-enzymatic electrochemical glucose detection;Inyang;Thin Solid Films,2020

3. Cupric oxide (CuO) thin films prepared by reactive dc magnetron sputtering technique for photovoltaic application;Dolai;J. Alloys Compd.,2017

4. Stability of sputter deposited cuprous oxide (Cu2O) subjected to aging condition for photovoltaic applications;Camacho-Espinosa;J. Appl. Phys.,2018

5. Effect of oxygen partial pressure on the tuning of copper oxide thin films by reactive sputtering for solar light driven photocatalysis;Srinivasan;Sol. Energy,2019

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