Oxidation characteristics of copper oxide thin films deposited by direct current sputtering under substrate temperature and post-deposition copper-ion implantation
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Published:2024-09
Issue:
Volume:804
Page:140485
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ISSN:0040-6090
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Container-title:Thin Solid Films
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language:en
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Short-container-title:Thin Solid Films
Author:
Devaraj P.ORCID,
Peranantham P.ORCID,
Devarani Devi K.ORCID,
Siva Kumar V.V.,
Jeyachandran Y.L.ORCID