CBVD grown HfO2 on TiN for high-precision MIM capacitor-Reference-Cited by-同舟云学术

CBVD grown HfO2 on TiN for high-precision MIM capacitor

Published:2023-02 Issue: Volume:650 Page:414541
ISSN:0921-4526
Container-title:Physica B: Condensed Matter
language:en
Short-container-title:Physica B: Condensed Matter

Author:

Rani Rashmi^ORCID,Maudez William^ORCID,Sayal Rajat,Rai Radheshyam,Kumar Sanjeev,Shamim Md Kashif^ORCID,Wagner Estelle^ORCID,Sharma Seema,Benvenuti Giacomo^ORCID

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference65 articles.

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1. A spectroscopic ellipsometry study of TiO₂:ZrO₂ on TiN/Si thin films prepared by Chemical Beam Vapor Deposition;Surface and Interface Analysis;2024-08-09

2. Contaminant-free layer-by-layer annealing to improve the properties of HfO₂/SiO₂ optical films for the fs laser;Optics Express;2024-07-30

3. HfO₂ Thin Films by Chemical Beam Vapor Deposition for Large Resistive Switching Memristors;IEEE Journal of the Electron Devices Society;2024