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Development of a novel tool for semiconductor process control

  • Published:2001-03 Issue:1-3 Volume:80 Page:60-64
  • ISSN:0921-5107
  • Container-title:Materials Science and Engineering: B
  • language:en
  • Short-container-title:Materials Science and Engineering: B

Author:

Gwilliam R.M.,Knights A.P.,Wendler E,Sealy B.J.,Burrows C.P.,Coleman P.G.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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1. Group III Nitrides;Springer Handbook of Electronic and Photonic Materials;2017

2. Positron follow-up in liquid water: II. Spatial and energetic study for the most important radioisotopes used in PET;Physics in Medicine and Biology;2007-10-26

3. Positron follow-up in liquid water: I. A new Monte Carlo track-structure code;Physics in Medicine and Biology;2006-03-07

4. Positron annihilation spectroscopy as a diagnostic tool for process monitoring of buried oxide layer formation in Si;Journal of Applied Physics;2003-01

5. Positron beams: The journey from fundamental physics to industrial application;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-05
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