On the ion flux and energy gain during pulsed DC operation of an opposed target magnetron
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference17 articles.
1. Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering
2. A comparison of the properties of titanium-based films produced by pulsed and continuous DC magnetron sputtering
3. Time-resolved investigation of plasma parameters during deposition of Ti and TiO2 thin films
4. Space and time resolved Langmuir probe measurements in a 100 kHz pulsed rectangular magnetron system
5. Electrostatic quadrupole plasma mass spectrometer and Langmuir probe measurements of mid-frequency pulsed DC magnetron discharges
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2. Pressure dependence of Ar${\hspace{0pt}}_2^+$ , ArTi+, and Ti${\hspace{0pt}}_2^+$ dimer formation in a magnetron sputtering discharge;Journal of Physics D: Applied Physics;2017-10-12
3. A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies;Journal of Alloys and Compounds;2010-10
4. Recent progress in thin film processing by magnetron sputtering with plasma diagnostics;Journal of Physics D: Applied Physics;2009-01-21
5. Microstructure and mechanical properties of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering on AISI H13 steel;Journal of Materials Science;2009-01
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