Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge-Reference-Cited by-同舟云学术

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Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge

Published:2019-01-07 Issue:1 Volume:125 Page:013301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Hippler R.¹²^ORCID,Cada M.²^ORCID,Stranak V.³,Helm C. A.¹^ORCID,Hubicka Z.²^ORCID

Affiliation:

1. Institut für Physik, Universität Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany

2. Institute of Physics, Academy of Science of the Czech Republic, Na Slovance 2, 18221 Prague, Czech Republic

3. Faculty of Science, University of South Bohemia, Branisovska 31, 37005 Ceske Budejovice, Czech Republic

Funder

Czech Science Foundation

Deutscher Akademischer Austauschdienst

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5055356

Reference51 articles.

1. Planar magnetron sputtering

2. Planar magnetron sputtering

3. Contributions to Plasma Physics

4. A novel pulsed magnetron sputter technique utilizing very high target power densities

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2. Effects of pulse time offset between Cr and Zr dual cathodes in closed-magnetic-field unipolar high-power impulse magnetron sputtering;Surface and Coatings Technology;2024-08

3. A Pulsed Hollow Cathode Discharge Operated in an Ar/N$$_2$$/O$$_2$$ Gas Mixture and the Formation of Nitric Oxide;Plasma Chemistry and Plasma Processing;2024-02-06

4. Flux of High-Energy Positive Oxygen Ions from Plasma to a Substrate in a Pulsed Magnetron Discharge with a Hot Target;Journal of Communications Technology and Electronics;2023-10

5. Azimuthal ion movement in HiPIMS plasmas—Part II: lateral growth fluxes;Plasma Sources Science and Technology;2023-10-01

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