Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference10 articles.
1. Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering
2. Glow Discharge Processes;Chapman,1980
3. The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system
4. Unbalanced magnetron ion‐assisted deposition and property modification of thin films
5. The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating
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