Gold-tantalum alloy films deposited by high-density-plasma magnetron sputtering-Reference-Cited by-同舟云学术

Gold-tantalum alloy films deposited by high-density-plasma magnetron sputtering

Published:2021-10-28 Issue:16 Volume:130 Page:165301
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Bae J. H.¹^ORCID,Bayu Aji L. B.²,Shin S. J.²^ORCID,Engwall A. M.²^ORCID,Nielsen M. H.²,Baker A. A.²^ORCID,McCall S. K.²,Moody J. D.²^ORCID,Kucheyev S. O.²

Affiliation:

1. General Atomics, San Diego, California 92186, USA

2. Lawrence Livermore National Laboratory, Livermore, California 94550, USA

Funder

Lawrence Livermore National Laboratory

General Atomics

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/am-pdf/10.1063/5.0050901

Reference54 articles.

1. Synthesis and characterization of Au–Ta nanocomposites for nanomechanical cantilever devices

2. Volume magnetic susceptibility design and hardness of Au–Ta alloys and Au–Nb alloys for MRI-compatible biomedical applications

3. The potential of imposed magnetic fields for enhancing ignition probability and fusion energy yield in indirect-drive inertial confinement fusion

4. Transient magnetic field diffusion considerations relevant to magnetically assisted indirect drive inertial confinement fusion

5. Sputtered Au–Ta films with tunable electrical resistivity

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