Deposition and characterization of a- and μc-Si:H thin films by ICP-CVD system with internal antennas-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Deposition and characterization of a- and μc-Si:H thin films by ICP-CVD system with internal antennas

Published:2013-09 Issue: Volume:231 Page:550-556
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hsieh J.H.,Liang H.C.,Setsuhara Y.,Li C.

Funder

National Science Council of the Republic of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference17 articles.

1. Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna

2. Inductively Coupled Plasma Source with Internal Straight Antenna

3. Characteristics of Parallel Internal-Type Inductively Coupled Plasmas for Large Area Flat Panel Display Processing

4. Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna

5. Development of high efficiency large area silicon thin film modules using VHF-PECVD

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasma-Enhanced Chemical Vapor Deposition of Silicon Films at Low Pressure in GEC Reference Cell;Plasma Physics Reports;2020-06

2. A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVD;Nanoscale Research Letters;2018-08-10

3. Structural analysis of polycrystalline silicon thin films produced by two different ICPCVD approaches;Materials Science in Semiconductor Processing;2018-03

4. Characteristics of Nanocrystalline Si:H Films Made by Inductively Coupled Plasma with Low-Inductance Antenna;Nanoscience and Nanotechnology Letters;2016-07-01

5. Nanocrystalline Si:H films made by inductively coupled plasma using internal low inductance antenna;Materials Science in Semiconductor Processing;2015-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3