Development of high efficiency large area silicon thin film modules using VHF-PECVD

Author:

Takatsuka Hiromu,Noda Matsuhei,Yonekura Yoshimichi,Takeuchi Yoshiaki,Yamauchi Yasuhiro

Publisher

Elsevier BV

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment

Reference22 articles.

1. Influence of plasma excitation frequency for a-Si:H thin film deposition;Curtins;Plasma Chem. Plasma Process. New York,1987

2. Goya, S., Nakano, Y., Yamashita, N., Morita, S., Yonekura, Y., 2003. Development of amorphous silicon/microcrystalline silicon tandem solar cells. WCPEC-3, 5O-A6-02

3. New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma;Heintze;J. Non-Cryst. Solids,1996

4. Analysis of high rate a-Si:H deposition in a VHF plasma;Heintze;J. Phys. D: Appl. Phys.,1993

5. High rate growth of microcrystalline silicon at low temperatures;Kondo;J. Non-Cryst. Solids,2000

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