Multiscale modeling of CVD film growth—a review of recent works-Reference-Cited by-同舟云学术

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Multiscale modeling of CVD film growth—a review of recent works

Published:2004-01 Issue: Volume:177-178 Page:245-251
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Dollet Alain

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference48 articles.

1. Handbook of Crystal Growth, vol. 3A;Jensen,1994

2. Handbook of Crystal Growth, vol. 1A;Gilmer,1993

3. A 3‐dimensional model for low‐pressure chemical‐vapor‐deposition step coverage in trenches and circular vias

4. Computational Materials Science;Raabe,1998

5. Multiscale modeling of thin film growth

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2. Microwave hydrogen plasma etching on the laser-cut surface of single crystal diamond: Phases, etching morphology, stress evolution and the effect of etching on the subsequent homoepitaxial growth;Diamond and Related Materials;2024-03

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