A 3‐dimensional model for low‐pressure chemical‐vapor‐deposition step coverage in trenches and circular vias
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.349797
Reference14 articles.
1. Monte Carlo low pressure deposition profile simulations
2. Deposition Profile Simulation Using the Direct Simulation Monte Carlo Method
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4. A Study on Radical Fluxes in Silane Plasma CVD from Trench Coverage Analysis
5. Prediction of Step Coverage during Blanket CVD Tungsten Deposition in Cylindrical Pores
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