Effects of CMP slurry additives on the agglomeration of alumina nanoparticles 1: General aggregation rate behavior
Author:
Publisher
Elsevier BV
Subject
Colloid and Surface Chemistry,Surfaces, Coatings and Films,Biomaterials,Electronic, Optical and Magnetic Materials
Reference31 articles.
1. Effect of Particle Size during Tungsten Chemical Mechanical Polishing
2. Chemical Mechanical Polishing (IV);Tateyama,2001
3. Effect of CMP Slurry Chemistry on Copper Nanohardness
4. Determining the Effects of Slurry Surfactant, Abrasive Size, and Abrasive Content on the Tribology and Kinetics of Copper CMP
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Role of alumina particles in chemical-mechanical synergies in ruthenium polishing;Journal of Materials Processing Technology;2024-09
2. Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution;Colloids and Surfaces A: Physicochemical and Engineering Aspects;2024-09
3. Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate;Materials Chemistry and Physics;2024-01
4. Exploration of Post-Cmp Cleaning - New Insights into the Synergistic Effect of Particle Removal of Surfactants in Citric Acid Based Systems: Experimental and Mechanistic Analysis;2024
5. Effect of Synergistic Ceo2/Mos2 Abrasives on Surface Roughness and Material Removal Rate Of Quartz Glass;2024
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3