Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate-Reference-Cited by-同舟云学术

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Effect of EDTA-modified alumina composite abrasive on the CMP performance of sapphire substrate

Published:2024-01 Issue: Volume:312 Page:128651
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Zhang Wei,Lei Hong^ORCID,Liu Wenqing,Zhang Zefang,Chen Yi,Hu Xiaogang,Ye Xiangshan

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference40 articles.

1. Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates;Lei;Mater. Chem. Phys.,2016

2. CMP behavior of alumina/metatitanic acid core–shell abrasives on sapphire substrates;Wang;Precis. Eng.,2017

3. Effects of CMP slurry additives on the agglomeration of alumina nanoparticles 1: general aggregation rate behavior;Brahma;J. Colloid Interface Sci.,2014

4. A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing;Shi;Surf. Coat. Technol.,2015

5. Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with different abrasives;Zou;Proc. Inst. Mech. Eng. Part J J. Eng. Tribol.,2014

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