Comprehensive analytical expression for dose dependent ion-implanted impurity concentration profiles-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Comprehensive analytical expression for dose dependent ion-implanted impurity concentration profiles

Published:1998-09 Issue:9 Volume:42 Page:1671-1678
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Suzuki Kunihiro,Sudo Ritsuo,Tada Yoko,Tomotani Miki,Feudel Thomas,Fichtner Wolfgang

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Channeling in low energy boron ion implantation

2. Interaction effects in the weakly localized regime and the anomalous conductivity of Sb-doped Ge at low temperature

3. A comparison between zero and seven degrees of tilt implantation of As+, P+ and BF2+

4. Computer simulation of atomic-displacement cascades in solids in the binary-collision approximation

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Depth profiling of low energy ion implantations in Si and Ge by means of micro-focused grazing emission X-ray fluorescence and grazing incidence X-ray fluorescence;Journal of Analytical Atomic Spectrometry;2015

2. An equivalent doping profile for CMOS substrate characterization;Solid-State Electronics;2013-01

3. Parameter Extraction Procedure for Ion Implantation Profiles to Establish Robust Database based on Tail Function;JSTS:Journal of Semiconductor Technology and Science;2010-12-31

4. Depth profiles of Al impurities implanted in Si wafers determined by means of the high-resolution grazing emission X-ray fluorescence technique;Spectrochimica Acta Part B: Atomic Spectroscopy;2010-06

5. Quasi Crystal Lindhard–Scharff–Schiott Theory and Database for Ion Implantation Profiles in Si1-xGexSubstrate Based on the Theory;Japanese Journal of Applied Physics;2009-07-21

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3