Effect of fluorinated graphene insulator on AlGaN/GaN MIS-HEMTs as gate dielectric

Author:

Ding Xiaoyu,Song Liang,He Tao,Sun Chi,Cai Yong,Zeng Chunhong,Zhang Kai,Zhang Xiaodong,Zhang Xinping,Zhang Baoshun

Funder

National Natural Science Foundation of China

Key Industry Technology Innovation Program of Suzhou

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Self-aligned ALD AlOX T-gate insulator for gate leakage current suppression in SiNx-passivated AlGaN/GaN HEMTs;Khan;Appl. Phys. Lett.,1993

2. AlGaN/GaN HEMTs-an overview of device operation and applications;Mishra;Proc. IEEE,2002

3. Charge control and mobility studies for an AlGaN/GaN high electron mobility transistor;Zhang;J. Appl. Phys.,1999

4. The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs;Vetury;IEEE Electron Device Lett.,2001

5. Surface passivation effects on AlGaN/GaN high-electron-mobility transistors with SiO2, Si3N4, and silicon oxynitride;Arulkumaran;Appl. Phys. Lett.,2004

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