Morphology of LPCVD Si3N4 films after high temperature treatment and HF etching
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Proc. Int. Conf. on Defect Control in Semiconductors;Beshkov,1990
2. On the Nature of CVD Si‐Rich SiO2 and Si3 N 4 Films
3. Spatial charge distribution in as-deposited and UV-illuminated gate-quality nitrogen-rich silicon nitride
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