Self assembled micro masking effect in the fabrication of SiC nanopillars by ICP-RIE dry etching-Reference-Cited by-同舟云学术

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Self assembled micro masking effect in the fabrication of SiC nanopillars by ICP-RIE dry etching

Published:2011-02 Issue:9 Volume:257 Page:3850-3855
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kathalingam A.,Kim Mi-Ra,Chae Yeon-Sik,Sudhakar S.,Mahalingam T.,Rhee Jin-Koo

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference30 articles.

1. Growth and Characterization of 3C-SiC Films for Micro Electro Mechanical Systems (MEMS) Applications

2. Modification of SiC based nanorods via a hydrogenated annealing process

3. Mg-Catalyzed Autoclave Synthesis of Aligned Silicon Carbide Nanostructures

4. Formation of Silicon Carbide Nanotubes and Nanowires via Reaction of Silicon (from Disproportionation of Silicon Monoxide) with Carbon Nanotubes

5. Ultrafast electron drift velocity overshoot in 3C–SiC

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1. Flexible refractive and diffractive micro-optical films shaped by fitting aspherical microprofiles with featured aperture and depth and their spatial arrangement for imaging applications;Journal of Vacuum Science & Technology B;2022-03

2. Progress in SiC nanowire field-effect-transistors for integrated circuits and sensing applications;Microelectronic Engineering;2022-02

3. Silicon carbide dry etching technique for pressure sensors design;Journal of Manufacturing Processes;2022-01

4. A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide;Materials;2021-12-24

5. RIE工艺参数对4H-SiC刻蚀速率和表面粗糙度的影响;Laser & Optoelectronics Progress;2021

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