Analysis of wavelength influence on a-Si crystallization processes with nanosecond laser sources-Reference-Cited by-同舟云学术

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Analysis of wavelength influence on a-Si crystallization processes with nanosecond laser sources

Published:2013-08 Issue: Volume:278 Page:214-218
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

García O.,García-Ballesteros J.J.,Munoz-Martin David,Núñez-Sánchez S.,Morales M.,Carabe J.,Torres I.,Gandía J.J.,Molpeceres C.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference21 articles.

1. A new era of crystallization: advances in polysilicon crystallization and crystal engineering;Voutsas;Applied Surface Science,2003

2. Excimer laser crystallization of amorphous silicon on metal coated glass substrates;Brendel;Thin Solid Films,2003

3. Handbook of Photovoltaic Science and Engineering;Luque,2003

4. Modeling experimental analysis in excimer-laser crystallization of a-Si films;Chen;Journal of Crystal Growth,2007

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