Excimer laser crystallization of amorphous silicon on metal coated glass substrates-Reference-Cited by-同舟云学术

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Excimer laser crystallization of amorphous silicon on metal coated glass substrates

Published:2003-03 Issue:1-2 Volume:427 Page:86-90
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Brendel K.,Nickel N.H.,Lengsfeld P.,Schöpke A.,Sieber I.,Nerding M.,Strunk H.P.,Fuhs W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. XeCl Excimer Laser Annealing Used to Fabricate Poly-Si TFT's

2. Nucleation and Growth of Crystalline Silicon Films on Glass for Solar Cells

3. Excimer-laser-annealed poly-Si thin-film transistors

4. Laser Processing of Polysilicon Thin-Film Transistors: Grain Growth and Device Fabrication

5. Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films

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1. Synthesis of Lithography Free Micro-Nano Electron Field Emitters Using Pulsed KrF Laser Assisted Metal Induced Crystallization of Thin Silicon Films;Integrated Ferroelectrics;2020-01-02

2. Pattern transfer, self-organized surface nanostructuring, and nanodrilling of sapphire using nanosecond laser irradiation;SPIE Proceedings;2016-03-04

3. Nanodrilling of fused silica using nanosecond laser radiation;Applied Surface Science;2015-10

4. Formation of regularly arranged large grain silicon islands by using embedded micro mirrors in the flash crystallization of amorphous silicon;Journal of Applied Physics;2014-01-21

5. Analysis of wavelength influence on a-Si crystallization processes with nanosecond laser sources;Applied Surface Science;2013-08

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