Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper-Reference-Cited by-同舟云学术

Preparation of monodisperse polystyrene/silica core–shell nano-composite abrasive with controllable size and its chemical mechanical polishing performance on copper

Published:2011-11 Issue:3 Volume:258 Page:1217-1224
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhang Lei,Wang Haibo,Zhang Zefang,Qin Fei,Liu Weili,Song Zhitang

Funder

National Integrate Circuit Research Program of China

Science and Technology Council of Shanghai

Chinese Academy of Sciences Visiting Professorship for Senior International Scientists

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference28 articles.

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2. Mechanisms of copper removal during chemical mechanical polishing;Steigerwald;J. Vac. Sci. Technol. B,1995

3. Characterization and optimization of copper chemical mechanical planarization;Laursen;J. Electron. Mater.,2002

4. Effect of soft agglomerates on CMP slurry performance;Basim;J. Colloid Interface Sci.,2002

5. Nanoscale indentation of polymer and composite polymer–silica core–shell submicrometer particles by atomic force microscopy;Armini;Langmuir,2007

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