Novel ceria/graphene oxide composite abrasives for chemical mechanical polishing

Author:

Chen Chuandong,Cui Yanying,Li Xiaopei,Shen Sida,Liao Wuping,You HongpengORCID

Publisher

Elsevier BV

Reference50 articles.

1. Chemical mechanical planarization: slurry chemistry, materials, and mechanisms;Krishnan;Chem. Rev.,2009

2. Atomic-scale planarization surface of quartz glass induced by novel green chemical mechanical polishing using three ingredients;Wang;Mater. Today Sustain.,2024

3. Angstrom surface on copper induced by novel green chemical mechanical polishing using ceria and silica composite abrasives;Liu;Appl. Surf. Sci.,2023

4. A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics;Liu;Nanoscale,2024

5. Development of core–shell SiO2@ A-TiO2 abrasives and novel photocatalytic chemical machinal polishing for atomic surface of fused silica;Fan;Appl. Surf. Sci.,2024

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