Remote plasma cleaning of optical surfaces: Cleaning rates of different carbon allotropes as a function of RF powers and distances
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference24 articles.
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4. Use of a commercial RF plasma cleaner in eliminating adventitious carbon contamination in an XPS system;Strein;Microsc. Microanal.,2008
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