Plasma analysis for the plasma immersion ion implantation processing by a PIC-MCC simulation
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,Hardware and Architecture
Reference14 articles.
1. Composite electrolytes
2. Model of plasma immersion ion implantation for voltage pulses with finite rise and fall times
3. Simulation of trench homogeneity in plasma immersion ion implantation
4. Computer simulation of plasma for plasma immersed ion implantation and deposition with bipolar pulses
5. Computer simulation of dose effects on composition profiles under ion implantation
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1. Simulation Analysis of the Neutral and Charged Intermediate Species Produced in the Triboplasma Using the PIC/MCC Method;Tribology Letters;2023-09-10
2. Improvement on Plasma Intensity Uniformity in Rectangular DC Magnetron Sputter by Optimizing Structures of Substrate Electrode;Journal of the Korean Society of Manufacturing Technology Engineers;2023-04-15
3. Particle-in-cell Monte Carlo collision simulation and experimental measurement of Ar plasma in a fast atom beam source for surface-activated bonding;Japanese Journal of Applied Physics;2021-03-02
4. Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition;Advances in Materials Science and Engineering;2017
5. Experiments on plasma immersion ion implantation inside conducting tubes embedded in an external magnetic field;Applied Surface Science;2015-12
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