Simulation of trench homogeneity in plasma immersion ion implantation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.373784
Reference19 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Plasma immersion ion implantation using plasmas generated by radio frequency techniques
3. Plasma immersion ion implantation—a fledgling technique for semiconductor processing
4. Homogeneity measurements of plasma immersion ion-implanted complex-shaped samples
5. Comparison of measured and calculated dose for plasma source ion implantation into 3-D objects
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