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Computer simulation of plasma for plasma immersed ion implantation and deposition with bipolar pulses

  • Published:2003-05 Issue: Volume:206 Page:767-771
  • ISSN:0168-583X
  • Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
  • language:en
  • Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Miyagawa Y.,Ikeyama M.,Miyagawa S.,Nakadate H.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference13 articles.

1. Y. Miyagawa, M. Tanaka, H. Nakadate, S. Nakao, Y. Miyagawa, in: Proceedings of 2000 Int. Conf. on Ion Implantation Technology, p. 213

2. Computer Simulation Using Particles;Hockney,1981

3. Plasma Physics via Computer Simulation;Birdsall,1985

4. C.K. Biersall, IEEE Trans. Plasma Sci. PS-19 (1991) 65

5. V. Vahedi, M. Surendra, Memorandum no. UCB/ERL M94/72, Electronics Research Laboratory, University of California, Berkley, 1994

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