Origin of homoepitaxial faulted island growth on the Si(111) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference19 articles.
1. Mechanistic Studies of Chemical Vapor Deposition
2. Role of hydrogen desorption in the chemical-vapor deposition of Si(100) epitaxial films using disilane
3. Epitaxial growth of silicon on Si(001) by scanning tunneling microscopy
4. Scanning-tunneling-microscopy studies of disilane adsorption and pyrolytic growth on Si(100)-(2x1)
5. Interaction of SiH4 with Si(100)2×1 and with Si(111)7×7 at 690 K: A comparative scanning tunneling microscopy study
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1. Epitaxy of Single Crystal Phase Change Materials on Si(111);MRS Proceedings;2011
2. Nanometer-Scale Structure Formation on Solid Surfaces;Nano- and Micromaterials;2008
3. Regular arrangement of nanometre-scale clusters by surface strain on stabilized Cl/Si(111);Journal of Physics: Condensed Matter;2007-02-13
4. Quantitative analysis of thermally induced desorption during halogen-etching of a silicon (111) surface;Surface Science;2006-08
5. Dependence of stacking-fault nucleation on cluster mobility;Physical Review B;2005-03-25
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