Author:
Impellizzeri G.,dos Santos J.H.R.,Mirabella S.,Napolitani E.,Carnera A.,Priolo F.
Subject
Instrumentation,Nuclear and High Energy Physics
Cited by
5 articles.
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1. Yield enhancement using source/drain BF2+ implant process optimization;2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC);2010-07
2. Fluorine-vacancy complexes in Si-SiGe-Si structures;Journal of Applied Physics;2007-07
3. Point defect engineering in preamorphized silicon enriched with fluorine;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-12
4. Fluorine in preamorphized Si: Point defect engineering and control of dopant diffusion;Journal of Applied Physics;2006-05-15
5. Fluorine incorporation in preamorphized silicon;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2006