Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Physical mechanisms of transient enhanced dopant diffusion in ion-implanted silicon

Published:1997-05 Issue:9 Volume:81 Page:6031-6050
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Stolk P. A.,Gossmann H.-J.,Eaglesham D. J.,Jacobson D. C.,Rafferty C. S.,Gilmer G. H.,Jaraíz M.,Poate J. M.,Luftman H. S.,Haynes T. E.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.364452

Reference89 articles.

1. Boron implantations in silicon: A comparison of charge carrier and boron concentration profiles

2. Rapid thermal annealing of boron‐implanted silicon using an ultrahigh power arc lamp

3. Modeling Rapid Thermal Diffusion of Arsenic and Boron in Silicon

4. Transient enhanced diffusion during rapid thermal annealing of boron implanted silicon

5. Transient enhanced diffusion of phosphorus in silicon

Cited by 566 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Physical mechanism underlying the enhancement effect of carbon in heavily phosphorus-doped Czochralski silicon substrate on phosphorus out-diffusion within n/n+ epitaxial wafer;Journal of Applied Physics;2024-06-17

2. Ion Implantation;Integrated Circuit Fabrication;2023-11-16

3. Atomic Diffusion Mechanism in BF2⁺ Implanted and Annealed n-Fz Si junction using Analytical Approach: Comparison with 2-D TCAD Process Simulation Result;Journal of Physics: Conference Series;2023-10-01

4. Machine Learning for Semiconductor Process Simulation Described by Coupled Partial Differential Equations;Advanced Theory and Simulations;2023-06-15

5. A review of plasma-induced defects: detection, kinetics and advanced management;Journal of Physics D: Applied Physics;2023-06-08

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3