TOF-RBS with medium energy heavy ion probe for semiconductor process analysis-Reference-Cited by-同舟云学术

TOF-RBS with medium energy heavy ion probe for semiconductor process analysis

Published:2004-06 Issue: Volume:219-220 Page:589-592
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Hayashi Kei,Takayama Hirosuke,Ishikawa Masao,Abo Satoshi,Lohner Tivadar,Takai Mikio

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference12 articles.

1. The International technology Roadmap for Semiconductors, Semiconductor Industry Association, 2001

2. Backscattering Spectrometry;Chu,1978

3. Handbook of Modern Ion Beam Materials Analysis;Leavitt,1995

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