Characterization of Si(100)/HfSiON interface
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference10 articles.
1. Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon
2. Plasma-enhanced chemical vapor deposition and characterization of high-permittivity hafnium and zirconium silicate films
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