Substrate heating by sputter-deposition of AlN: the effects of dc and rf discharges in nitrogen atmosphere
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Substrate heating in cylindrical magnetron sputtering sources
2. Substrate heating rates for planar and cylindrical-post magnetron sputtering sources
3. Energy transfer into the growing film during sputter deposition: An investigation by calorimetric measurements and Monte Carlo simulations
4. Sputter Deposition Processes
5. Optical and structural properties of highly c-axis oriented aluminum nitride prepared by sputter-deposition in pure nitrogen
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1. The influence of pulse duration and duty cycle on the energy flux to the substrate in high power impulse magnetron sputtering;Vacuum;2023-10
2. Effect of RF power on AlN film crystallinity in low pressure range using Ar-20%N2 gases by magnetic mirror-type magnetron cathode;Japanese Journal of Applied Physics;2022-03-16
3. Surface Acoustic Wave-Based Infrared Sensor With Aluminum Nitride Films Deposited;IEEE Sensors Journal;2020-11-15
4. Energy flux measurements during magnetron sputter deposition processes;Surface and Coatings Technology;2019-11
5. Substrate Heating Effect on c-Axis Texture and Piezoelectric Properties of AlN Thin Films Deposited by Unbalanced Magnetron Sputtering;JOM;2016-03-29
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